Growth behavior and surface morphology of Ag rough thin films deposited on silicone oil surfaces

被引:28
|
作者
Feng, CM [1 ]
Ge, HL
Tong, MR
Ye, GX
Jiao, ZK
机构
[1] Zhejiang Univ, Dept Phys, Hangzhou 310027, Peoples R China
[2] Hangzhou Univ, Cent Lab, Hangzhou 310028, Peoples R China
关键词
deposition process; surface morphology; sputtering; scanning electron microscopy;
D O I
10.1016/S0040-6090(98)01151-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The growth behavior and surface morphology of a rough film system, deposited on silicone oil drop surfaces by a r.f. magnetron sputtering method, have been studied. An anomalous film growth relaxation is observed during the deposition process. The relaxation rate is extremely sensitive to the substrate temperature. The surface morphology at the micrometer length scale is very susceptible to the substrate temperature, the incident r.f. capacity, and the nature of the solid substrate on which the oil drop is dripped. A discussion on the physical origins of these phenomena is also presented. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:30 / 34
页数:5
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