Power deposition in H-2 and H-2-N-2 glow discharges

被引:9
|
作者
Nagpal, R
Ganguly, BN
Bletzinger, P
Garscadden, A
机构
关键词
D O I
10.1016/0009-2614(96)00479-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Analyses and experiments on the fractional dissociation of H-2 in glow discharges in pure H-2 and in H-2-N-2 mixtures are reported. The fractional power deposited in the dissociation of H-2 calculated from the Boltzmann transport analysis compares well with that required by our experimental data for absolute H atom densities. The analysis also provides generic guidelines towards identification of dominant dissociation processes in molecular gas mixture discharges. The results for low current glow discharges in H-2-N-2 mixtures show that the vibrational energy reservoir of N-2(X(1) Sigma(g)(+) v) must directly or indirectly be an important factor in the dissociation of H-2.
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页码:386 / 392
页数:7
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