Parasitic extraction: Current state of the art and future trends

被引:0
|
作者
Kao, WF [1 ]
Lo, CY
Basel, M
Singh, R
机构
[1] Magma Design Automat, Cupertino, CA 95014 USA
[2] Cadence Design Syst, San Jose, CA 95134 USA
[3] Alchemy Semicond, Austin, TX 78757 USA
关键词
capacitance; crosstalk; delay calculation; inductance; interconnect modeling; parasitic extraction; resistance;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With the increase in circuit performance (higher speeds) and density (smaller feature size) in deep submicrometer (DSM) designs, interconnect parasitic effects are increasingly becoming more important. This paper first surveys the state of the art in parasitic extraction for resistance, capacitance, and inductance. The paper then covers other related issues such as interconnect modeling, model order reduction, delay calculation, and signal integrity issues such as crosstalk. Some future trends on parasitic extraction, model reduction and interconnect modeling are discussed and a fairly complete list of references is given.
引用
收藏
页码:729 / 739
页数:11
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