Preparation of amino group functionalized diamond using photocatalyst and thermal conductivity of diamond/copper composite by electroplating

被引:10
|
作者
Ishida, Naoya [1 ,2 ]
Kato, Kazuki [1 ,2 ]
Suzuki, Norihiro [1 ]
Fujimoto, Kenjiro [1 ,2 ]
Hagio, Takeshi [3 ]
Ichino, Ryoichi [3 ]
Kondo, Takeshi [1 ,2 ]
Yuasa, Makoto [1 ,2 ]
Uetsuka, Hiroshi [1 ,4 ]
Fujishima, Akira [1 ]
Terashima, Chiaki [1 ,2 ]
机构
[1] Tokyo Univ Sci, Photocatalysis Int Res Ctr, 2641 Yamazaki, Noda, Chiba 2788510, Japan
[2] Tokyo Univ Sci, Fac Sci & Technol, Dept Pure & Appl Chem, 2641 Yamazaki, Noda, Chiba 2788510, Japan
[3] Nagoya Univ, Inst Mat Innovat, Inst Innovat Future Soc, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648601, Japan
[4] Asahi Diamond Ind Co Ltd, 787 Tabi, Ichihara, Chiba 2900515, Japan
关键词
Diamond; Copper; Heat sink; Amino-group functionalization; Photocatalytic reaction; MICROSTRUCTURE; MATRIX; BORON;
D O I
10.1016/j.diamond.2021.108509
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We focused on a micro diamond (MD) particle with the highest thermal conductivity among existing materials and aimed to make a MD/copper composite material by electroplating. However, copper is naturally non-wetting with MD due to its chemical incompatibility, leading to weak interfacial bonding and high thermal resistance. We improved the wettability between MD and copper functionalized by the amino group on the MD using a pho-tocatalytic reaction. The functionalization of the diamond surface by amino groups was achieved by treating the MDs in a 3-aminopropyltrimethoxysilane-containing solution. The amino group functionalized MD was dispersed in the electroplating bath, where copper was deposited on the MD. As a result, the composite material of amino group functionalized MD assisted by photocatalyst and copper improved their interfacial affinity and exhibited the high thermal conductivity of 595 W/m K.
引用
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页数:5
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