共 50 条
- [1] Relative domination between Cl+ and Cl2+ ions in time-modulated inductively coupled Cl2 plasma investigated with laser-induced fluorescence technique [J]. MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 202 - 203
- [5] Chlorine molecular ions measured in time-modulated inductively coupled plasma by the laser-induced fluorescence technique [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (02): : 205 - 210
- [6] Inductively coupled plasma etching of III-nitrides in Cl2/Xe, Cl2/Ar and Cl2/He [J]. MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH, 1999, 4 : art. no. - G6.56
- [7] Laser-induced thermal desorption analysis of the surface during Ge etching in a Cl2 inductively coupled plasma [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (06): : 3266 - 3273
- [9] Inductively coupled plasma etching of GaN using Cl2/Ar and Cl2/N2 gases [J]. J Appl Phys, 3 (1970-1974):
- [10] Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (01): : 43 - 52