机构:
TDK Corp, Mat Dev Ctr, Technol & IP HQ, Ichikawa, Chiba 2728558, Japan
Kyoto Univ, Dept Mat Sci & Engn, Kyoto 6068501, JapanTDK Corp, Mat Dev Ctr, Technol & IP HQ, Ichikawa, Chiba 2728558, Japan
Umeda, Yuji
[1
,2
]
论文数: 引用数:
h-index:
机构:
Hayashi, Hiroyuki
[2
]
Moriwake, Hiroki
论文数: 0引用数: 0
h-index: 0
机构:
Japan Fine Ceram Ctr, Nanostruct Res Lab, Nagoya, Aichi 4568587, Japan
NIMS, Ctr Mat Res Informat Integrat CMI2, Tsukuba, Ibaraki 3050047, JapanTDK Corp, Mat Dev Ctr, Technol & IP HQ, Ichikawa, Chiba 2728558, Japan
Moriwake, Hiroki
[3
,4
]
Tanaka, Isao
论文数: 0引用数: 0
h-index: 0
机构:
Kyoto Univ, Dept Mat Sci & Engn, Kyoto 6068501, Japan
Japan Fine Ceram Ctr, Nanostruct Res Lab, Nagoya, Aichi 4568587, JapanTDK Corp, Mat Dev Ctr, Technol & IP HQ, Ichikawa, Chiba 2728558, Japan
Tanaka, Isao
[2
,3
]
机构:
[1] TDK Corp, Mat Dev Ctr, Technol & IP HQ, Ichikawa, Chiba 2728558, Japan
[2] Kyoto Univ, Dept Mat Sci & Engn, Kyoto 6068501, Japan
[3] Japan Fine Ceram Ctr, Nanostruct Res Lab, Nagoya, Aichi 4568587, Japan
[4] NIMS, Ctr Mat Res Informat Integrat CMI2, Tsukuba, Ibaraki 3050047, Japan
We report on the search for new dielectric materials suitable for use in ceramic capacitors at high frequencies and temperatures by a large set of first-principles calculations. Crystal data of 3,382 candidate compounds were obtained from the Materials Project database. 2,393 compounds without an imaginary phonon mode were subjected to the computation of dielectric constants based on the density functional perturbation theory (DFPT). Among them 24 compounds exhibit a dielectric constant higher than 100, which is a benchmark value corresponding to a typical paraelectric material, rutile TiO2. The list of compounds of high dielectric constant includes not only known dielectric and/or piezoelectric materials, such as SrHfO3, KTaO3, and AgTaO3, but also compounds that are not generally used for such applications. Efforts to experimentally verify the high dielectric constant are under way. (C) 2018 The Japan Society of Applied Physics
机构:
Univ N Carolina, Lab Mol Modeling, Div Chem Biol & Med Chem, UNC Eshelman Sch Pharm, Chapel Hill, NC 27599 USABar Ilan Univ, Dept Chem, IL-5290002 Ramat Gan, Israel
机构:
Univ N Carolina, UNC Eshelman Sch Pharm, Div Chem Biol & Med Chem, Lab Mol Modeling, Chapel Hill, NC 27599 USABar Ilan Univ, Dept Chem, IL-5290002 Ramat Gan, Israel
机构:
Iowa State Univ, Combinatorial Sci & Mat Informat Collaboratory Co, Ames, IA 50011 USA
Iowa State Univ, Inst Combinatorial Discovery, Dept Mat Sci & Engn, Ames, IA 50011 USAIowa State Univ, Combinatorial Sci & Mat Informat Collaboratory Co, Ames, IA 50011 USA
机构:
Technol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, JapanTechnol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, Japan
Oba, Yusuke
Umeda, Yuji
论文数: 0引用数: 0
h-index: 0
机构:
Technol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, JapanTechnol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, Japan
Umeda, Yuji
Ishii, Daiki
论文数: 0引用数: 0
h-index: 0
机构:
Technol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, JapanTechnol & IP HQ TDK Corp, Mat Res Ctr, 2-15-7 Higashi Ohwada, Chiba 2728558, Japan