Effects of X-ray radiation on the surface chemical composition of plasma deposited thin fluorocarbon films

被引：11

作者：

Himmerlich, M. ^{[1
,2
]}

Yanev, V. ^{[3
]}

Opitz, A. ^{[4
]}

Keppler, A. ^{[1
,2
]}

Schaefer, J. A. ^{[1
,2
]}

Krischok, S. ^{[1
,2
]}

机构：

[1] Tech Univ Ilmenau, Inst Phys, D-98684 Ilmenau, Germany

[2] Tech Univ Ilmenau, Inst Mikro & Nanotechnol, D-98684 Ilmenau, Germany

[3] Fraunhofer Inst Integrierte Syst & Bauelementetec, D-91058 Erlangen, Germany

[4] Univ Augsburg, Inst Phys, D-86153 Augsburg, Germany

来源：

POLYMER DEGRADATION AND STABILITY | 2008年 / 93卷 / 03期

关键词：

fluorocarbon films; plasma polymerisation; x-ray irradiation; x-ray photoelectron spectroscopy; fluorocarbon degradation;

D O I：

10.1016/j.polymdegradstab.2007.12.004

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Different thin fluorocarbon (FC) films were deposited on Si(111) using plasma polymerisation and then exposed to X-ray radiation. Changes in the chemical composition of the deposited fluorocarbon films as a function of irradiation time were investigated in situ using X-ray photoelectron spectroscopy. The evaluation of the C1s and F1s core level induced emission as a function of exposure to X-ray radiation (Mg K alpha, hv = 1253.6 eV) reveals changes in the surface chemical composition of the FC polymer structure. The presented results indicate a high defluorination under X-ray irradiation. Additionally, binding energy shifts of the F1s and C1s peaks during the exposure associated with surface charging effects were observed. With ongoing exposure the surface charging decreases continuously and the FC surfaces become more conductive due to changes in the polymer structure. Different models have been used to describe the decomposition kinetics and surface composition. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：700 / 706

页数：7

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