X-ray absorption fine-structure determination of interfacial polarization in SrTiO3 thin films grown on Si(001)

被引:0
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作者
Woicik, J. C. [1 ]
Aguirre-Tostada, F. S. [2 ]
Herrera-Gomez, A. [2 ]
Droopad, R. [3 ]
Yu, Z. [3 ]
Schlom, D. [4 ]
Karapetrova, E. [5 ]
Zschack, P. [5 ]
Pianetta, P. [6 ]
机构
[1] NIST, Gaithersburg, MD 20899 USA
[2] CINVESTAV Quertero, Queretaro 76001, Mexico
[3] Motorola Inc, Phys Sci Res Labs, Tempe, AZ 85284 USA
[4] Penn State Univ, University Pk, PA 16802 USA
[5] Univ Illinois, APS UNICAT, Argonne Natl Lab, Argonne, IL 60439 USA
[6] Stanford Synchrotron Radiat Lab, Stanford, CA 94309 USA
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Polarization-dependent X-ray absorption. ne structure together with X-ray diffraction have been used to study the local structure in SrTiO(3) thin films grown on Si(001). Our data indicate that an interfacial polarization of the SrTiO(3) layer by the Si substrate results in a tetragonal distortion of the SrTiO(3) unit cell.
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页码:620 / 622
页数:3
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