Structure of Nb films deposited by means of ultra-high vacuum cathodic arc technique

被引：0
|
作者：
Nietubyc, R. [1 ]
Pelka, J. [2 ]
Sadowski, M. J. [1 ]
Strzyzewski, P. [1 ]
机构：
[1] Andrzej Soltan Inst Nucl Studies, PL-05400 Otwock, Poland
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
来源：
PLASMA 2007 | 2008年 / 993卷
关键词：
Nb films; vacuum cathodic arc; x-ray diffraction; influence of ion energy;
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
We report the x-ray diffraction studies of the structure of the Ultra High Vacuum Cathodic Arc (UHVCA) deposited Nb/sapphire 0001 films. An influence of deposition conditions on the resulting structure was analyzed by x-ray diffraction measurements performed for a series of samples deposited applying various ion energies. We found that obtained niobium films contain two distinct phases differing in crystallites size and orientation. For all films, the tetragonal distortion of the crystalline structure was found. An out-of-plane lattice expansion depends on the ions energy. Films show a preferred orientation of the crystalline planes.
引用
收藏
页码：415 / +
页数：2
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