A general figure of merit for thick and thin transparent conductive carbon nanotube coatings
被引:19
|
作者:
Pekker, A.
论文数: 0引用数: 0
h-index: 0
机构:
Hungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, HungaryHungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, Hungary
Pekker, A.
[1
]
Kamaras, K.
论文数: 0引用数: 0
h-index: 0
机构:
Hungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, HungaryHungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, Hungary
Kamaras, K.
[1
]
机构:
[1] Hungarian Acad Sci, Res Inst Solid State Phys & Opt, H-1525 Budapest, Hungary
We suggest a wavelength-dependent figure of merit for transparent conducting nanotube networks, composed of the sheet resistance and the optical density. We argue that this would be more useful than other suggestions prevailing in the literature because it relies on more realistic assumptions regarding the optical parameters of real nanotubes: it takes into account the fact that the dc resistivity depends on the concentration of free carriers, while the visible absorption is caused by bound carriers. Based on sheet resistance measurements and wide-range transmission spectra, we compare several commercial nanotube types and find correlation between metal enrichment and figure of merit. A simple graphical approach is suggested to determine if the required optical and transport properties can be achieved by varying the thickness of the nanotube layer or a more aggressive treatment is needed. The procedure can be extended to oxide coatings as well. (C) 2010 American Institute of Physics. [doi:10.1063/1.3476278]
机构:
Univ Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Univ Arkansas, Dept Appl Sci, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Li, Zhongrui
Kandel, Hom R.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Dept Phys & Astron, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Kandel, Hom R.
Dervishi, Enkeleda
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Univ Arkansas, Dept Appl Sci, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Dervishi, Enkeleda
Saini, Viney
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Univ Arkansas, Dept Appl Sci, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Saini, Viney
Xu, Yang
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Univ Arkansas, Dept Appl Sci, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Xu, Yang
Biris, Alexandru R.
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Res & Dev Isotop & Mol Technol, R-400293 Cluj Napoca, RomaniaUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Biris, Alexandru R.
Lupu, Dan
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Res & Dev Isotop & Mol Technol, R-400293 Cluj Napoca, RomaniaUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Lupu, Dan
Salamo, Gregory J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Dept Phys, Fayetteville, AR 72701 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Salamo, Gregory J.
Biris, Alexandru S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
Univ Arkansas, Dept Appl Sci, Little Rock, AR 72204 USAUniv Arkansas, Nanotechnol Ctr, Little Rock, AR 72204 USA
机构:
Univ Nacl Autonoma Mexico, Inst Invest Mat, Ciudad De Mexico 04510, MexicoUniv Nacl Autonoma Mexico, Inst Invest Mat, Ciudad De Mexico 04510, Mexico
Muhl, S.
Aguilar Osorio, R.
论文数: 0引用数: 0
h-index: 0
机构:
Inst Politecn Nacl, SEPI ESIME Zac, UPALM, Edificio 5,3er Piso Col, Ciudad De Mexico 07738, MexicoUniv Nacl Autonoma Mexico, Inst Invest Mat, Ciudad De Mexico 04510, Mexico
Aguilar Osorio, R.
Martinez Huitle, U. A.
论文数: 0引用数: 0
h-index: 0
机构:
Inst Politecn Nacl, SEPI ESIME Zac, UPALM, Edificio 5,3er Piso Col, Ciudad De Mexico 07738, MexicoUniv Nacl Autonoma Mexico, Inst Invest Mat, Ciudad De Mexico 04510, Mexico