Optical metrology for DMD™ characterization

被引:0
|
作者
Miller, SA [1 ]
Mezenner, R [1 ]
Doane, D [1 ]
机构
[1] Texas Instruments Inc, Digital Imaging, Dallas, TX 75243 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Digital Micromirror Device (TM) (DMD (TM)) developed at Texas Instruments is a spatial light modulator composed of 500,000 to 1.3 million movable micromachined aluminum mirrors. The DMD (TM) serves as the engine for the current generation of computer-driven slide and video projectors, and for next generation devices in digital television and movie projectors. Because of the unique architecture and applications of the device, Texas Instruments has developed a series of customized optical testers for characterizing DMD (TM) performance. This paper provides a general overview of the MirrorMaster, a custom optical inspection tool. Particular attention is given to Bias Adhesion Mapping (BAM) as a device performance metric. BAM is an optical test that monitors the performance of the mirrors as a function of an applied voltage. This voltage drives the mirrors to the 'on' or 'off' position, and as the bias is stepped down the mirrors return to their neutral orientations. Important forces involved in this process include the electrostatic field applied, the compliance of the hinge, and static friction (stiction). BAM curves can help characterize device stiction and allow us to examine the efficacy of the lubrication system over the lifetime of the device.
引用
收藏
页码:521 / 525
页数:5
相关论文
共 50 条
  • [1] Characterization of optical systems for radial metrology
    Matthys, DR
    Gilbert, JA
    Fair, SB
    [J]. PROCEEDINGS OF THE SEM IX INTERNATIONAL CONGRESS ON EXPERIMENTAL MECHANICS, 2000, : 104 - 107
  • [2] ALP:: Universal DMD controller for metrology and testing
    Höfling, R
    Ahl, E
    [J]. LIQUID CRYSTAL MATERIALS, DEVICES, AND APPLICATIONS X AND PROJECTION DISPLAYS X, 2004, 5289 : 322 - 329
  • [3] Metrology characterization of the PLATO Telescope Optical Units
    Pagliazzi, M.
    Dami, M.
    Pompei, C.
    Taiti, M.
    Novi, A.
    Battistelli, E.
    Fossati, E.
    Farinato, J.
    Magrin, D.
    Ragazzoni, R.
    [J]. SPACE TELESCOPES AND INSTRUMENTATION 2022: OPTICAL, INFRARED, AND MILLIMETER WAVE, 2022, 12180
  • [4] Towards superfast 3D optical metrology with digital micromirror device (DMD) platforms
    Bell, Tyler
    Zhang, Song
    [J]. EMERGING DIGITAL MICROMIRROR DEVICE BASED SYSTEMS AND APPLICATIONS VI, 2014, 8979
  • [5] Spectroscopic optical metrology for process characterization and control
    Allgair, John
    Herrera, Pedro
    [J]. Microlithography World, 2002, 11 (01): : 12 - 16
  • [6] Digital Micromirror Arrays (DMD) -: a proven MEMS technology looking for new emerging applications in optical metrology
    Höfling, R
    Dunn, C
    [J]. FRINGE 2005, 2006, : 672 - +
  • [7] Optical metrology for 193nm immersion objective characterization
    Aronstein, D
    Bentley, J
    Dewa, P
    Dunn, M
    Schreiber, H
    Nguyen, T
    Webb, J
    [J]. OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 836 - 845
  • [8] OPTICAL METROLOGY
    CAULFIELD, HJ
    [J]. OPTICAL ENGINEERING, 1979, 18 (05) : 447 - 447
  • [9] Characterization of dynamic random process using optical vortex metrology
    Xinzhong Li
    Yuping Tai
    Liping Zhang
    Huijuan Li
    Liben Li
    [J]. Applied Physics B, 2014, 116 : 901 - 909
  • [10] Characterization of dynamic random process using optical vortex metrology
    Li, Xinzhong
    Tai, Yuping
    Zhang, Liping
    Li, Huijuan
    Li, Liben
    [J]. APPLIED PHYSICS B-LASERS AND OPTICS, 2014, 116 (04): : 901 - 909