Copy EXACTLY! A paradigm shift in technology transfer method

Semiconductor manufacturing is characterized by very complex process flows, with many individual process steps, many of which are built to very close tolerances. Furthermore complex interactions exist, whereby each process step can effect many other seeps, and each final device parameter might be determined by the results from many inputs. This level of complexity is increasing with each new technology generation. Items which were once considered second order effects, such as barometric pressure and ultra pure water temperature are now important variables effecting process results. The costs of technology development and capital equipment for production are very high, and increasing with each generation, which puts a great deal of importance on technology transfer. Once a new process flow and product portfolio have been developed, it is essential that the technology transfer to mass production take place as quickly as possible, without disruptive quality issues, and with the highest possible yield. No time is available to debug new problems which occur during the transfer. The traditional technology transfer approach often allows many equipment and process changes to be made. These are desired as improvements, or for the convenience of the production factory which may be already producing other products. As the technology becomes more complex, this has resulted in unforeseen problems which cause production start up delays and inferior results. The Copy EXACTLY! philosophy and systems have been developed in order to minimize the time required for a technology transfer, and to ensure product quality and yields are not compromised. This paper will describe this methodology and some of the results obtained. In addition to the increase in technology transfer performance, some side benefits are also discussed.