Fabrication of Ordered 2D Colloidal Crystals on Flat and Patterned Substrates by Spin Coating

Spin coating is a simple and rapid method for fabricating ordered monolayer colloidal crystals on flat as well as patterned substrates. In this article, we show how a combination of factors, particularly concentration of the dispensed colloidal solution (C-n) and spin-coating speed, influences the ordering process. We have performed systematic experiments on different types of substrates with two types of colloidal particles (polystyrene and silica). We also show that even when perfect ordering is achieved at some locations, there might be a significant spatial variation in the deposit morphology over different areas of the sample. Our experiments reveal that higher C-n is required for obtaining perfect arrays, as the diameter of the colloids (d(D)) increases. Interestingly, a combination of higher C-n and rotational speed (expressed as revolutions per minute) is required to achieve perfect ordering on a topographically patterned substrate, as compared to that on a flat surface, because of loss of inertia of the particles during outward flow because of impact on the substrate features. Finally, we also identify the relation between the particle diameter and the height of the pattern features to achieve topography-mediated particle ordering.