Distributions of functional groups in plasma polymerized allylamine films by scanning force microscopy using functionalized probe tips

被引:47
|
作者
Schönherr, H
van Os, MT
Förch, R
Timmons, RB
Knoll, W
Vancso, GJ
机构
[1] Univ Twente, MESA Res Inst, NL-7500 AE Enschede, Netherlands
[2] Fac Chem Technol Mat Sci & Technol Polymers, NL-7500 AE Enschede, Netherlands
[3] Max Planck Inst Polymer Res, D-55128 Mainz, Germany
[4] Univ Texas, Dept Chem & Biochem, Arlington, TX 76019 USA
关键词
D O I
10.1021/cm0010351
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of poly(allylamine) on silicon were prepared by polymerization of allylamine in a pulsed glow-discharge plasma reactor. The films were characterized by surface plasmon spectroscopy (SPS) and waveguide mode spectroscopy (WAMS), as well as by X-ray photoelectron spectroscopy (XPS) and FT-IR spectroscopy. It was shown that by variation of the duty cycle the film thickness as well as the content of amino and nitrile groups could be controlled. Scanning force microscopy (SFM) measurements with chemically functionalized tips led to a qualitative correlation of adhesion forces with the content of amino groups. Laterally resolved adhesion force measurements indicated the presence of a heterogeneous local environment of the amino groups, with patches exhibiting differences in hydrophobicity on a sub-50-nm scale.
引用
收藏
页码:3689 / 3694
页数:6
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