Voids formation and Cu3Sn growth mechanisms in Cu/Cu3Sn/Cu6Sn5 system under air in Cu/SnAg joints for microelectronic packaging

被引:3
|
作者
Barik, El Mostafa [1 ,2 ]
Gillot, Charlotte [1 ]
Hodaj, Fiqiri [2 ]
机构
[1] Univ Grenoble Alpes, CEA, LETI, MINATEC Campus, Grenoble, France
[2] Univ Grenoble Alpes, SIMAP, Grenoble INP, CNRS, F-38000 Grenoble, France
关键词
DIFFUSION; SOLDER; KINETICS; CU6SN5; IMC;
D O I
10.1007/s10854-022-09305-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The technological advances reached today in semi-conductor devices and their applications increased the challenges in terms of power density. The introduction of new and high-temperature mission profiles made the integrated circuits packaging reach their limit and emerged new reliability issues that did not exist for previous generation devices. As a response to the increasing power density issues, the transient liquid phase bonding (TLPB) technique, which consists of transforming pure metals or alloys into intermetallic compounds (IMCs) with high-thermal stability, is one of the most studied techniques nowadays. The same principle is used also to increase the thermal stability of a system by the solid-state reaction (SSR) technique. The present work focus on the solid-state reactions occurring during transformation, under air atmosphere, of the initial Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu system to the final Cu/Cu3Sn/Cu system with a much higher thermal stability. The experiments were performed on interconnections using Cu pillar and SnAg solder alloy technologies. Cu and Sn-2 wt%Ag bumps with a size of 90 x 90 mu m(2) were deposited using electro-chemical deposition process with a thickness of 20 mu m and 15 mu m, respectively. In a first step, the initial system was obtained using the TLPB process in the Cu/liquid Sn/Cu system performed under air at 250 degrees C. Afterwards, the isothermal SSR process in the Cu/Cu3Sn/Cu6Sn5/Cu3Sn/Cu system was studied at 250 degrees C under air for holding times from 1 to 124 h. After the experiments, cross-sections of the samples were characterized by optical and scanning electron microscopy. The growth kinetics of Cu3Sn compound was studied for samples with two initial thicknesses of Sn-Ag alloy: 15 and 30 mu m. A critical thickness of Cu3Sn layer beyond which a drastic change in its growth kinetics was observed. This phenomenon was accompanied by a significant change in the microstructure of the joint. An island-shape microstructured Cu3Sn within Cu was observed accompanied by formation of Cu oxide layers. The growth mechanisms of Cu3Sn phase responsible for different observed microstructures are presented and discussed.
引用
收藏
页码:26190 / 26204
页数:15
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