Impact of heat treatment on the physical properties of sputtered nickel oxide thin films containing molybdenum

被引：0

作者：

Abdel-Wahab, M. Sh ^{[1
,2
]}

Hammad, A. H. ^{[1
,3
]}

机构：

[1] King Abdulaziz Univ, Ctr Nanotechnol, Jeddah 21589, Saudi Arabia

[2] Beni Suef Univ, Fac Postgrad Studies Adv Sci, Mat Sci & Nanotechnol Dept, Bani Suwayf 62511, Egypt

[3] Natl Res Ctr, Electron Microscope & Thin Films Dept, Phys Res Div, Giza 12622, Egypt

来源：

JOURNAL OF OVONIC RESEARCH | 2022年 / 18卷 / 01期

关键词：

Nickel oxide; Sputtering; Molybdenum; Structure; Optical properties; OPTICAL-PROPERTIES; ELECTROCHROMIC PROPERTIES; NIO; PERFORMANCE; METAL;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of annealing the substrate on the structural and optical properties of the nickel oxide thin films containing a fixed ratio of molybdenum was investigated. Energy- dispersive X-ray spectroscopy (EDX) revealed that the Mo ratio is 4.41 wt%. X-ray diffraction (XRD) revealed that the formed films comprise a phase of NiO0.96. The average crystallite size, dislocation density, and strain function were calculated. Atomic force microscopy (AFM) was employed to investigate the morphology and surface roughness. With the increase in the substrate temperature from 298 K to 673 K, the optical band gap values varied from 3.72 eV to 3.58 eV.

引用

页码：1 / 10

页数：10

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