Hydrodynamic modeling of RF noise in CMOS devices

被引:0
|
作者
Jungemann, C [1 ]
Neinhüs, B [1 ]
Nguyen, CD [1 ]
Meinerzhagen, B [1 ]
Dutton, RW [1 ]
Scholten, AJ [1 ]
Tiemeijer, LF [1 ]
机构
[1] Stanford Univ, Ctr Integrated Syst, Stanford, CA 94305 USA
关键词
D O I
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中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The first hydrodynamic RF noise model for CMOS devices including a consistent set of quantum correction and mobility models for the inversion layer is presented. Good agreement of simulations and recent noise measurements for deep sub-micron devices is obtained. In the case of classical and non-classical CMOS devices with channel lengths of 50nm it is found that the drain excess noise factor is still below two and the increase in drain noise for short channel devices is therefore not as dramatic as previously reported.
引用
收藏
页码:871 / 874
页数:4
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