Thin film imaging technology on glass and plastic

被引：0

作者：

Nathan, A ^{[1
]}

Park, B ^{[1
]}

Sazonov, A ^{[1
]}

Tao, S ^{[1
]}

Gu, ZH ^{[1
]}

Chan, I ^{[1
]}

Servati, P ^{[1
]}

Karim, K ^{[1
]}

Charania, T ^{[1
]}

Striakhilev, D ^{[1
]}

Ma, Q ^{[1
]}

Murthy, RVR ^{[1
]}

机构：

[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3E5, Canada

来源：

ICM 2000: PROCEEDINGS OF THE 12TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS | 2000年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reviews X-ray imaging technology in terms of detector operating principles, including optoelectronic characteristics, and fabrication process issues related to pixel (detector + thin film transistor) integration. Recent results which describe the extension of the current fabrication processes to low (similar to 120 degreesC) temperature will also be presented. The low temperature processing enables fabrication of thin film electronics on flexible (polymer) substrates.

引用

页码：11 / 14

页数：4

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