Nanosphere lithography using thermal evaporation of gold

被引:0
|
作者
Flavel, B. S. [1 ]
Shapter, J. G. [1 ]
Quinton, J. S. [1 ]
机构
[1] Flinders Univ South Australia, Sch Chem Phys & Earth Sci, Sturt Rd,Bedford Pk, Adelaide, SA 5001, Australia
关键词
nanosphere lithography; surface patterning;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
Nanosphere lithography, which allows for the fabrication of patterned metal surfaces, is a simple, effective and unconventional technique that exploits a self-assembly process. Using this technique, polystyrene nanospheres with diameters of 500nm, and 1 mu m were assembled onto a 'muscovite' mica substrate in a hexagonally close packed monolayer array, to provide a physical mask for material deposition. Thermal evaporation was subsequently used to deposit gold through the nanosphere mask layer, to generate a periodic array of gold nanostructures. Upon changing the mask to a multilayered array of nanospheres, slightly more complex nanostructures were achieved. However due to thermal evaporation being a high temperature process the nanostructures obtained deviated from their predicted quasi triangular shape due to a slight annealing of the polystyrene mask.
引用
收藏
页码:57 / +
页数:2
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