Annealing and surface conduction on Hydrogen peroxide treated bulk melt-grown, single crystal ZnO

被引:8
|
作者
Mtangi, W. [1 ]
Nel, J. M. [1 ]
Auret, F. D. [1 ]
Chawanda, A. [1 ]
Diale, M. [1 ]
Nyamhere, C. [2 ]
机构
[1] Univ Pretoria, Dept Phys, ZA-0002 Pretoria, South Africa
[2] Nelson Mandela Metropolitan Univ, Dept Phys, ZA-6031 Port Elizabeth, South Africa
基金
新加坡国家研究基金会;
关键词
Hall effect; Surface conduction; Zinc interstitials; Annealing; Shallow donors; DONORS;
D O I
10.1016/j.physb.2011.09.101
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report on the studies carried out on hydrogen peroxide treated melt-grown, bulk single crystal ZnO samples. Results show the existence of two shallow donors in the as-received ZnO samples with energy levels (37.8 +/- 0.3) meV that has been suggested as Zn-i related and possibly H-complex related and (54.5 +/- 0.9) meV, which has been assigned to an Al-related donor. Annealing studies performed on the hydrogen peroxide treated samples reveal the existence of a conductive channel in the samples in which new energy levels have been observed, Zn vacancies, related to the Group I elements, X-Zn. The surface donor volume concentration of the conductive channel was calculated from a theory developed by Look (2007) [1]. Results indicate an increase in the surface volume concentration with increasing annealing temperature from 60 x 10(17) cm(-3) at 200 degrees C to 4.37 x 10(18) cm(-3) at 800 degrees C. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1624 / 1627
页数:4
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