Nanoimprinting of Flexible Polycarbonate Sheets with a Flexible Polymer Mold and Application to Superhydrophobic Surfaces

被引:54
|
作者
Liang, Chia-Ching [1 ]
Lin, Chun-Hung [1 ,2 ,3 ]
Cheng, Tsung-Chieh [4 ]
Shieh, Jiann [5 ]
Lin, Hsi-Ho [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Photon, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan
[3] Natl Cheng Kung Univ, Ctr Micronano Sci & Technol, Tainan 701, Taiwan
[4] Natl Kaohsiung Univ Appl Sci, Dept Mech Engn, Kaohsiung 807, Taiwan
[5] Natl United Univ, Dept Mat Sci & Engn, Miaoli 360, Taiwan
来源
ADVANCED MATERIALS INTERFACES | 2015年 / 2卷 / 07期
关键词
HIGH-RESOLUTION; MECHANICAL-PROPERTIES; FLUOROCARBON PLASMAS; RECENT PROGRESS; FREE-VOLUME; LITHOGRAPHY; FABRICATION; TEMPERATURE; COMPOSITE; ARRAYS;
D O I
10.1002/admi.201500030
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
This study demonstrates a reliable process for the direct nanoimprinting of a flexible polycarbonate (PC) sheet using a perfluoropolyether (PFPE) mold. PC is a commonly used flexible substrate with optical transparency, low thermal expansion coefficient, high mechanical strength, and excellent deformation resistivity. The imprint performances of PFPE, hard/soft-polydimethylsiloxane, and silicon molds are compared. Given that the heating temperature is near the glass transition temperature (approximate to 153 degrees C) of PC, only PFPE mold can be fully patterned into PC substrate with viable integrity. The mechanical property and gas permeability of the materials are investigated to determine the mechanism of the flexible PFPE mold, which performs better than a rigid silicon mold. Nanoimprint process using a PFPE mold is performed at 153 degrees C and 5 bars. The lower imprint temperature or imprint pressure of the proposed process compared with those from previous studies is favorable in nanoimprinting. Finally, nanoroughness-on-nanopillar hierarchical surfaces, which possess superhydrophobic slippery characteristics superior to those of nanoroughness-only surfaces, are obtained by treating PC nanopillar arrays imprinted by PFPE mold with C4F8 plasma.
引用
收藏
页数:10
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