Study on TiNx films and Ti target surface nitrided by rf dc coupled reactive magnetron sputtering

被引：2
|
作者：
Suzuki, M [1 ]
Tanaka, T [1 ]
Kawabata, K [1 ]
机构：
[1] Hiroshima Inst Technol, Hiroshima 7315193, Japan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 05期
关键词：
D O I：
10.1116/1.581473
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
[No abstract available]
引用
收藏
页码：3142 / 3144
页数：3
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