Effect of microstructure on the nanomechanical properties of TiVCrZrAl nitride films deposited by magnetron sputtering

被引：12

作者：

Chang, Zue-Chin ^{[2
]}

Liang, Shih-Chang ^{[3
]}

Han, Sheng ^{[1
]}

机构：

[1] Natl Taichung Inst Technol, Dept Leisure & Recreat Management, Taichung 40401, Taiwan

[2] Natl Chin Yi Univ Technol, Dept Mech Engn, Taiping City 41101, Taichung County, Taiwan

[3] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 40227, Taiwan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 18期

关键词：

Nanoindentation; TiVCrZrAl nitride films; Hardness; HIGH-ENTROPY ALLOYS; MECHANICAL-PROPERTIES; FCC;

D O I：

10.1016/j.nimb.2011.05.027

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This paper describes the nanoindentation behavior of TiVCrZrAl nitride films grown on Si substrates by means of reactive radio-frequency magnetron sputtering at growth temperatures from 150 to 300 degrees C. We used cross-sectional transmission electron microscopy and X-ray diffraction to analyze the microstructure and crystallinity and nanoindentation techniques to study the hardness and elastic modulus. We found that a face-centered-cubic solid-solution structure with strong (2 0 0), (1 1 1), (2 2 0), and (3 1 1) orientations were revealed by X-ray diffraction. Upon increasing the growth temperature of the films, the hardness and elastic modulus increased to maximum values of 15.2 and 203.5 GPa, respectively. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：1973 / 1976

页数：4

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