Growth and characterization of nonpolar ZnO (1 0 (1)over-bar 0) epitaxial film on γ-LiAlO2 substrate by chemical vapor deposition

被引：40
|
作者：
Chou, Mitch M. C. [1 ]
Chang, Liuwen
Chung, Hsiao-Yi
Huang, Teng-Hsing
Wu, Jih-Jen
Chen, Chun-Wei
机构：
[1] Natl Sun Yat Sen Univ, Dept Mat Sci & Opto Elect Engn, Kaohsiung 80424, Taiwan
[2] Natl Cheng Kung Univ, Dept Chem Engn, Tainan 701, Taiwan
[3] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei 106, Taiwan
来源：
JOURNAL OF CRYSTAL GROWTH | 2007年 / 308卷 / 02期
关键词：
Czochralski method; chemical vapor deposition; zinc compounds;
D O I：
10.1016/j.jcrysgro.2007.08.019
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
A simple chemical vapor deposition approach to the growth of nonpolar ZnO with [1 0 (1) over bar 0] orientation on a gamma-LiAlO2 substrate is presented. The dependence of growth characteristics on the growth temperature is investigated. Following the CVD growth, the surface morphologies of ZnO film were investigated by a scanning electron microscope. The characterizations of structure and orientation by a scanning transmission electron microscope indicate that the ZnO film is oriented in the nonpolar [1 0 (1) over bar 0] m-direction. Photoluminescence result of nonpolar ZnO shows a strong UV emission peak at around 375 nm at room temperature. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：412 / 416
页数：5
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