Growth of 1-2 μm thick biaxially textured Bi-2212 films on (100) LaAlO3 single crystal substrates by electrodeposition

被引:3
|
作者
Chen, J [1 ]
Bhattacharya, RN [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
来源
关键词
Bi2Sr2Ca1Cu2Ox; critical current density; melt process;
D O I
10.1016/S0921-4534(03)01309-1
中图分类号
O59 [应用物理学];
学科分类号
摘要
High quality Bi2Sr2Ca1Cu2Ox (Bi-2212) films with thickness around 1-2 mum have been grown on (1 0 0) LaAlO3 single crystal substrates using an electrodeposition technique, followed by a melt quench and annealing process. X-ray diffraction (XRD) measurements of the final films indicated that the films were almost pure biaxially textured Bi-2212 films. The full width at half maximum (FWHM) of omega and phi scans were about 1.7degrees and 1.1degrees, respectively. In magnetization measurements, T-c of 79 K and J(c) of 0.58 MA/cm(2) (4.2 K, 0 T) and 44 kA/cm(2) (50 K, 0 T) were observed. The mechanism of the convention of Bi-2201 phase to Bi-2212 phase during the annealing process was discussed, the length scale for the current flow in Bi-2212 film was calculated from the differential susceptibility dm/dH during repenetration of magnetic field, and the residual stress in the films were estimated from XRD 0-20 scans. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:171 / 177
页数:7
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