Structure of the ultrathin aluminum oxide film on NiAl(110)

被引:326
|
作者
Kresse, G
Schmid, M
Napetschnig, E
Shishkin, M
Köhler, L
Varga, P
机构
[1] Univ Vienna, Inst Mat Phys, A-1090 Vienna, Austria
[2] Univ Vienna, Ctr Computat Mat Sci, A-1090 Vienna, Austria
[3] Vienna Univ Technol, Inst Allgemeine Phys, A-1040 Vienna, Austria
关键词
D O I
10.1126/science.1107783
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The well-ordered aluminum oxide film formed by oxidation of the NiA[(110) surface is the most intensely studied metal surface oxide, but its structure was previously unknown. We determined the structure by extensive ab initio modeling and scanning tunneling microscopy experiments. Because the topmost aluminum atoms are pyramidally and tetrahedrally coordinated, the surface is different from all Al2O3 bulk phases. The film is a wide-gap insulator, although the overall stoichiometry of the film is not Al2O3 but Al10O13. We propose that the same building blocks can be found on the surfaces of bulk oxides, such as the reduced corundum (0001) surface.
引用
收藏
页码:1440 / 1442
页数:3
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