Ultrasonic attenuation in glasses of SiO2-GeO2 mixture

被引：10

作者：

Kosugi, T

Kobayashi, H

Kogure, Y

机构：

[1] NATL RES LAB METROL, TSUKUBA, IBARAKI 305, JAPAN

[2] NISHI TOKYO UNIV, YAMANASHI 40901, JAPAN

来源：

PHYSICA B-CONDENSED MATTER | 1996年 / 219-20卷

关键词：

D O I：

10.1016/0921-4526(95)00713-X

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Ultrasonic absorption on Si0(2)-5 mole% GeO2 and SiO2-10 mole% GeO2 glasses between 1.6-250 K shows that the most probable origin of the structural relaxation of SiO2 glass is the transverse motion of the oxygen atom in Si-O-Si bridge among existing models. In addition it is also suggested that the same structure is the origin of two-level system (TLS) phenomena below 10 K.

引用

页码：261 / 263

页数：3

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