Demonstration of high wall-plug efficiency III-nitride micro-light-emitting diodes with MOCVD-grown tunnel junction contacts using chemical treatments

被引:14
|
作者
Wong, Matthew S. [1 ]
Back, Joonho [2 ]
Hwang, David [1 ]
Lee, Changmin [1 ]
Wang, Jianfeng [1 ]
Gandrothula, Srinivas [1 ]
Margalith, Tal [1 ]
Speck, James S. [1 ]
Nakamura, Shuji [1 ,2 ]
DenBaars, Steven P. [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
关键词
microLED; III-nitride; tunnel junction; GaN; InGaN; LED; InGaN devices; GAN; DAMAGE; PERFORMANCE;
D O I
10.35848/1882-0786/ac1230
中图分类号
O59 [应用物理学];
学科分类号
摘要
High wall-plug efficiency (WPE) micro-light-emitting diodes with metalorganic chemical vapor deposition-grown tunnel junction (TJ) contacts are demonstrated. By employing chemical treatments before sidewall activation, the 20 x 20 mu m(2) TJ devices resulted in a voltage penalty of 0.2 V at 20 A cm(-2), compared to devices with indium-tin oxide (ITO) contacts. Moreover, the enhancement in light output power was more than 40% higher than ITO devices. Hence, the TJ devices yielded the peak external quantum efficiency (EQE) and WPE of 56% and 55%, respectively, indicating the improvements of 64% and 77% in peak EQE and WPE compared to ITO devices.
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页数:5
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