Modeling and fabrication of optical interference rugate filters

Fabrication of continuously modulated refractive index dielectric interference filters of rugated design was presented using the microwave plasma assisted chemical vapor deposition (MPACVD) technique. A neuro-fuzzy model was developed for modeling the process of depositing thin film materials on an alumina substrate. It was found that the model can be used to simulate the behavior of the process and to design algorithm for obtaining the required response. It can also be used to test the effect of extending the current refractive index range and different operating wavelengths.