Bulk Dislocation Core Dissociation Probed by Coherent X Rays in Silicon

被引:43
|
作者
Jacques, V. L. R. [1 ,2 ]
Ravy, S. [2 ]
Le Bolloc'h, D. [1 ]
Pinsolle, E. [1 ,2 ]
Sauvage-Simkin, M. [2 ]
Livet, F. [3 ]
机构
[1] Univ Paris Sud, Phys Solides Lab, CNRS UMR 8502, F-91405 Orsay, France
[2] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France
[3] INP Grenoble CNRS UJF, F-38402 St Martin Dheres, France
关键词
ELECTRON-MICROSCOPY; DIFFRACTION; SEMICONDUCTORS; RESOLUTION; STRAIN;
D O I
10.1103/PhysRevLett.106.065502
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report on a new approach to probe bulk dislocations by using coherent x-ray diffraction. Coherent x rays are particularly suited for bulk dislocation studies because lattice phase shifts in condensed matter induce typical diffraction patterns which strongly depend on the fine structure of the dislocation cores. The strength of the method is demonstrated by performing coherent diffraction of a single dislocation loop in silicon. A dissociation of a bulk dislocation is measured and proves to be unusually large compared to surface dislocation dissociations. This work opens a route for the study of dislocation cores in the bulk in a static or dynamical regime, and under various external constraints.
引用
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页数:4
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