UV-photodetector based on NiO/diamond film

被引:46
|
作者
Chang, Xiaohui [1 ]
Wang, Yan-Feng [1 ]
Zhang, Xiaofan [1 ]
Liu, Zhangcheng [1 ]
Fu, Jiao [1 ]
Fan, Shuwei [1 ]
Bu, Renan [1 ]
Zhang, Jingwen [1 ]
Wang, Wei [1 ]
Wang, Hong-Xing [1 ]
Wang, Jingjing [2 ]
机构
[1] Xi An Jiao Tong Univ, Inst Wide Band Gap Semicond, Xian 710049, Shaanxi, Peoples R China
[2] Heibei Semicond Res Inst, Nation Key Lab ASIC, Shijiazhuang 050051, Hebei, Peoples R China
关键词
DIAMOND DETECTORS; FABRICATION;
D O I
10.1063/1.5004269
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, a NiO/diamond UV-photodetector has been fabricated and investigated. A single crystal diamond (SCD) layer was grown on a high-pressure-high-temperature Ib-type diamond substrate by using a microwave plasma chemical vapor deposition system. NiO films were deposited directly by the reactive magnetron sputtering technique in a mixture gas of oxygen and argon onto the SCD layer. Gold films were patterned on NiO films as electrodes to form the metal-semiconductor-metal UV-photodetector which shows good repeatability and a 2 orders of magnitude UV/visible rejection ratio. Also, the NiO/diamond photodetector has a higher responsivity and a wider response range in contrast to a diamond photodetector. Published by AIP Publishing.
引用
收藏
页数:5
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