Kinetic coefficient of Ni solid-liquid interfaces from molecular-dynamics simulations

被引:116
|
作者
Sun, DY [1 ]
Asta, M
Hoyt, JJ
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Acad Sinica, Inst Solid State Phys, Hefei 230031, Peoples R China
关键词
D O I
10.1103/PhysRevB.69.024108
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The kinetics of isothermal crystallization and melting are studied for elemental Ni employing non-equilibrium molecular-dynamics simulations based on interatomic potentials of the embedded-atom-method form. These simulations form the basis for calculations of the magnitude and crystalline anisotropy of the kinetic coefficient mu, defined as the constant of proportionality between interface velocity and undercooling. We obtain highly symmetric rates for crystallization and melting, from which we extract the following values of mu for low index {100}, {110}, and {111} interfaces: mu(100)=35.8+/-22, mu(110)=25.5+/-1.6, and mu(111)=24.1+/-4.0 in units of cm/s K. The results of the present study are discussed in the context of previous molecular-dynamics simulations for related systems, and kinetic models based upon transition-state and density-functional theories.
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页数:11
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