Synthesis of epitaxial graphene on rhodium from 3-pentanone

被引:23
|
作者
Roth, Silvan [1 ]
Osterwalder, Juerg [1 ]
Greber, Thomas [1 ]
机构
[1] Univ Zurich, Inst Phys, CH-8057 Zurich, Switzerland
基金
瑞士国家科学基金会;
关键词
Graphene; Chemical vapor deposition; Photoelectron spectroscopy; STATES; FILMS;
D O I
10.1016/j.susc.2011.02.007
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The synthesis of high quality single layer graphene on rhodium, g/Rh(111), is reported. The graphene layers are grown at 1060 K by low pressure chemical vapor deposition (CVD) using 3-pentanone as a precursor molecule. The presented growth technique shows an easy high quality production method for epitaxial graphene monolayers. The chemical composition and structural properties of such self-assembled monolayers were characterized by X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED). Scanning Tunneling Microscopy (STM) confirms the formation of a 3 nm super cell and a unique surface morphology which establishes the potential of g/Rh(111) as a template for molecules. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:L17 / L19
页数:3
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