Venture ships EUV light

被引:0
|
作者
不详
机构
来源
MICRO | 2003年 / 21卷 / 04期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:23 / +
页数:2
相关论文
共 50 条
  • [1] Germany to fund EUV venture
    不详
    [J]. MICRO, 2002, 20 (06): : 27 - 27
  • [2] New venture to commercialize EUV litho technology
    不详
    [J]. SOLID STATE TECHNOLOGY, 1998, 41 (07) : 58 - +
  • [3] Advances in EUV light sources
    Farrar, Nigel R.
    La Fontaine, Bruno M.
    Fomenkov, Igor V.
    Brandt, David C.
    [J]. ADVANCED OPTICAL TECHNOLOGIES, 2012, 1 (04) : 279 - 287
  • [4] Throwing light on a new venture
    [J]. Electrical Review, 1993, 226 (05):
  • [5] Micromachining of Polydimethylsiloxane using EUV light
    Fukami, Shintaro
    Torii, Shuichi
    Makimura, Tetsuya
    Okazaki, Kota
    Nakamura, Daisuke
    Takahashi, Akihiko
    Okada, Tatsuo
    Niino, Hiroyuki
    Murakami, Koichi
    [J]. 2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR), 2013,
  • [6] A new light source for EUV lithography
    Das, Saswato R.
    [J]. IEEE SPECTRUM, 2008, 45 (03) : 14 - 14
  • [7] Shedding light on EUV mask inspection
    Seki, Kazunori
    Badger, Karen
    Gallagher, Emily
    Konishi, Toshio
    McIntyre, Gregory
    [J]. PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIX, 2012, 8441
  • [8] Portable diagnostics for EUV light sources
    Stuik, R
    Constantinescu, R
    Hegeman, P
    Jonkers, J
    Fledderus, HF
    Banine, V
    Bijkerk, F
    [J]. SOFT X-RAY AND EUV IMAGING SYSTEMS, 2000, 4146 : 121 - 127
  • [9] EUV light source development in Japan
    Endo, A
    [J]. FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2003, 5063 : 269 - 273
  • [10] Novel EUV mask black border suppressing EUV and DUV OoB light reflection
    Ito, Shin
    Kodera, Yutaka
    Fukugami, Norihito
    Komizo, Toru
    Maruyama, Shingo
    Watanabe, Genta
    Yoshida, Itaru
    Kotani, Jun
    Konishi, Toshio
    Haraguchi, Takashi
    [J]. PHOTOMASK JAPAN 2016: XXIII SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY, 2016, 9984