Mechanistic study of photochemical reactions on the surfaces of group IV materials

被引：0

作者：

Wang, Xiaoyu ^{[1
]}

Hamers, Robert J. ^{[1
]}

机构：

[1] Univ Wisconsin, Dept Chem, Madison, WI 53706 USA

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2010年 / 239卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

1194-INOR

引用

页数：1

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