Evauation of particle removal efficiency of filters in high temperature sulfuric acid using 30 nm liquid particle counter

被引：0
|
作者：
Takakura, Tomoyuki [1 ]
Tsuzuki, Shuichi [1 ]
机构：
[1] Nihon Pall Ltd, 46 Kasuminosato, Ami, Ibaraki 3000315, Japan
来源：
2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM) | 2015年
关键词：
filtration; particle removal efficiency; liquid particle counter; sulfuric acid;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页数：4
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