Characterization of multilayer pvd nanocoatings deposited on tungsten carbide cutting tools

被引：20
|
作者：
Kumar, C. H. R. Vikram [1 ]
Nair, P. Kesavan [2 ]
Ramamoorthy, B. [1 ]
机构：
[1] Indian Inst Technol, Dept Mech Engn, Madras 600036, Tamil Nadu, India
[2] Indian Inst Technol, Dept Met Engn, Madras 600036, Tamil Nadu, India
来源：
INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY | 2008年 / 38卷 / 5-6期
关键词：
multilayer coatings; physical vapour deposition; sputtering;
D O I：
10.1007/s00170-007-1059-z
中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
The present trends in the coating technologies are gradient coatings, metastable coatings, multicomponaent coatings and multilayer or super lattice coatings. The physical vapour deposition (PVD) process is well-suited technology for these advanced coating technologies. The performance of the coated tools can be improved considerably using multi-layer micro and nanocoatings. The present paper discusses the deposition and characterization of multilayer TiN/Al2O3 coatings on cemented tungsten carbide cutting tools using reactive sputtering. The characterization of the coatings was carried out using X-ray diffraction (XRD) for phase analysis, chemical composition using EDAX, adhesion and toughness evaluation using Rockwell indentation test and surface roughness. It was observed that with decrease in thickness of each alumina layer to nanolevel in multilayer coating system results considerable improvement in final surface finish, adhesion and toughness of the coating. The experimental results are presented and analyzed in this paper.
引用
收藏
页码：622 / 629
页数：8
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