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High-Gain Gated Lateral Power Bipolar Junction Transistor
被引:4
|作者:
Wang, Jia
[1
,2
]
Xie, Ya-Hong
[1
]
Amano, Hiroshi
[3
]
机构:
[1] Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90024 USA
[2] Nagoya Univ, Dept Elect, Grad Sch Engn, Nagoya, Aichi 4648603, Japan
[3] Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Aichi 4648601, Japan
关键词:
Bipolar transistors;
gain;
gallium nitride;
MOSFET;
power semiconductor devices;
silicon carbide;
4H-SIC BJTS;
OPERATION;
GAN;
D O I:
10.1109/LED.2021.3099982
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We demonstrated a prototype Gated Lateral power bipolar junction transistor (GLP-BJT) on wide bandgap semiconductor. The device combined the intrinsic advantages of high current gain of a Gated Lateral-BJT and good current handling and voltage blocking capabilities of GaN material. As a result, the common-emitter current gain remained over 300 at a high collector current density of 2 kA/cm(2) despite a wide p- base region of 2 mu m. The open base breakdown voltageBVCEO was over 300 V corresponding to a high critical field of 2.5MV/cm. These figures ofmerit show great promise of GaN-based GLP-BJT in power applications and also shed light on the development of stateof- the-art bipolar transistors based on other wide bandgap semiconductors.
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页码:1370 / 1373
页数:4
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