On the optical constants of TiO2 thin films.: Ellipsometric studies

被引：24

作者：

Mardare, D ^{[1
]}

Stancu, A ^{[1
]}

机构：

[1] Alexandru Ioan Cuza Univ, Fac Phys, R-6600 Iasi, Romania

来源：

MATERIALS RESEARCH BULLETIN | 2000年 / 35卷 / 12期

关键词：

thin films; oxides; sputtering; X-ray diffraction; optical properties;

D O I：

10.1016/S0025-5408(00)00408-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiO2 thin films were obtained on unheated glass substrates by a DC reactive magnetron sputtering method. The as-deposited films exhibit an amorphous structure as observed from X-ray diffraction (XRD) patterns. The structure changes to a mixed one of 70% anatase and 30% rutile after heat treatment in air in the temperature range 293-673 K. Using ellipsometric measurements, and a computer to solve the corresponding equations, a modeling technique was used to find the optical constants of the studied thin films. A sensitivity analysis was performed. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：2017 / 2025

页数：9

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