Mechanical properties of Al2O3-doped (2 wt.%) ZnO films

被引:11
|
作者
Kuriki, Shina [1 ]
Kawashima, Toshitaka [1 ]
机构
[1] Sony Corp, Core Component Business Unit, Core Technol Dev Grp, Shinagawa Ku, Tokyo 1410001, Japan
关键词
transparent conductive oxide; ZnO : Al; mechanical properties; nano indentation; adhesion;
D O I
10.1016/j.tsf.2007.04.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report a new method of evaluating the adhesion of Al2O3-doped (2 wt.%) ZnO (AZO) thin films. The AZO films were deposited by DC reactive magnetron sputtering on plastic film (PET: polyethylencterephthalatc) at various sputtering pressures, power, and reactive gas-flow ratios. The adhesion test of the films was carried out using the nanoindentation system. The fracture point as determined by the load-displacement curve occurred at the time of separation between the thin film and the substrate. The integration value of load and displacement to the fracture point is defined as the degree of adhesion (S-w). The AZO films showed that adhesion increase as sputtering power increases and sputtering pressure decreases. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:8594 / 8597
页数:4
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