Realizing Metal and Quantum Dot Containing Patterns by Two-Photon Lithography

被引:0
|
作者
Prabhakran, Prem [1 ]
Son, Yong [2 ]
Jang, Kyung Kook [1 ]
Yang, Dong-Yol [2 ]
Lee, Kwang-Sup [1 ]
机构
[1] Hannam Univ, Dept Polymer Sci & Engn, Taejon 306791, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Mech Engn, Taejon 305701, South Korea
关键词
Two-Photon Lithography; silver nanoparticles; quantum dots; photoreduction; SILVER NANOPARTICLES; AQUEOUS-SOLUTION; THERMAL-DECOMPOSITION; NANOCRYSTALS; CLUSTERS; MICROSTRUCTURES; TEMPERATURE; ABSORPTION; GROWTH; SU-8;
D O I
10.1117/12.897002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We summarize here studies aimed at incorporating silver nanoparticles or semiconductor nanoparticles ( quantum dots) into polymeric microstructures. Two different approaches are followed in the case of silver nanoparticles and quantum dots (QDs). In case of silver a combination of photoreduction and thermal annealing are adapted. This combination is used to reduce a silver salt precursor to generate silver nanoparticles inside a photopolymerizable resin. Quantum dots were functionalized with photocrosslinkable ligands to enable their easy integration into a photopatternable resin.
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页数:9
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