Effect of p-NiO Interlayer on Internal Quantum Efficiency of p-GaN/n-ZnO Light-Emitting Devices

被引:10
|
作者
Sirkeli, Vadim P. [1 ,2 ,3 ]
Yilmazoglu, Oktay [1 ]
Kueppers, Franko [1 ]
Hartnagel, Hans L. [1 ]
机构
[1] Tech Univ Darmstadt, Inst Mikrowellentech & Photon, D-64283 Darmstadt, Germany
[2] Moldova State Univ, Fac Phys & Engn, MD-2009 Kishinev, Moldova
[3] Comrat State Univ, Dept Informat Technol Math & Phys, MD-3805 Comrat, Moldova
关键词
Light-Emitting Diode; Zinc Oxide; Gallium Nitride; Nickel Oxide; Internal Quantum Efficiency; DIODES; SILICON;
D O I
10.1166/jno.2014.1687
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on numerical investigations of p-GaN/n-ZnO light-emitting devices with p-NiO interlayer, and on LED design optimization which includes bandgap engineering, thickness and doping of constituent layers. The current voltage dependences of investigated LEDs show a threshold voltage of 3.1 V and 5.4 V for the LED devices without and with presence of p-NiO interlayer, respectively. It is found that p-NiO layer act as electron blocking layer, that lead to the enhance of charge carriers confinement in active region, and to the increasing of internal quantum efficiency (IQE) of LED device up to 0.5%, that in four times higher in compare with that for original p-GaN/n-ZnO LED device.
引用
收藏
页码:811 / 818
页数:8
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