Fabrication of two-dimensional tungsten photonic crystals for high-temperature applications

被引:30
|
作者
Araghchini, M. [1 ]
Yeng, Y. X. [1 ]
Jovanovic, N. [1 ]
Bermel, P. [1 ]
Kolodziejski, L. A. [1 ]
Soljacic, M. [1 ]
Celanovic, I. [1 ]
Joannopoulos, J. D. [1 ]
机构
[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA
来源
基金
美国国家科学基金会;
关键词
emissivity; lithography; microfabrication; photonic crystals; sputter etching; tungsten; ACHROMATIC INTERFEROMETRIC LITHOGRAPHY; GRATINGS; GENERATION; GRIDS;
D O I
10.1116/1.3646475
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article details microfabrication of two-dimensional tungsten photonic crystals (2D W PhCs) for high-temperature applications such as selective thermal emitters for thermophotovoltaic energy conversion. In particular, interference lithography and reactive ion etching are used to produce large area single crystal tungsten 2D PhCs. For this investigation, we fabricated a 2D W PhC sample consisting of an array of cylindrical cavities with 800 nm diameter, 1.2 mu m depth, and 1.2 mu m period. Extensive characterization and calibration of all microfabrication steps are presented. Experimentally obtained thermal emissivity spectrum is shown to match well with numerical simulations. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3646475]
引用
收藏
页数:4
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