Reactions of POxCly- ions with O2(a 1Δg), H2O, and Cl2 at 298 K

被引:11
|
作者
Midey, Anthony J. [1 ]
Dotan, Itzhak [1 ]
Viggiano, A. A. [1 ]
机构
[1] USAF, Res Lab, Space Vehicles Directorate, Hanscom AFB, MA 01731 USA
关键词
kinetics; phosphorus oxychloride; oxygen singlet delta; chlorine; water;
D O I
10.1016/j.ijms.2008.02.005
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
The rate constants and product branching ratios for the reactions of phosphorus oxychloride anions, POxCly- for x = 1-2 and y = 1-3, with O-2(a (1) Delta(g)), Cl-2, and H2O have been measured in a selected ion flow tube (SIFT) at 298 K. A mixture of O-2(a (1) Delta g) in O-2 has been produced using a recently designed chemical singlet oxygen generator (sparger) with an emission detection scheme adopted previously in our laboratory. The experiments continue a series of investigations into the oxidation reactions of POxCly- ions, searching for pathways to the terminal PO2- and PO3- ions observed in combustion chemistry with POCl3 present. None of the POxCly- ions react with H2O or O-2(a (1) Delta g). The O-2(a (1) Delta g) rate constants have a limit of < 1 x 10(-11) cm(3) s(-1), except for PO2Cl- where a limit of <5 x 10(-11) cm(3) s(-1) has been determined. The H2O rate constants have limits of < 1 x 10(-11) cm(3) s(-1). All of the POxCly- ions react with Cl-2, excluding PO3- and PO2Cl2-. Depending on the reactant ion, Cl-, Cl-2(-) or PO2Cl2- product ions form. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:7 / 10
页数:4
相关论文
共 50 条
  • [1] Reactions of POxCly- ions with H and H2 from 298 to 500 K
    Midey, AJ
    Miller, TM
    Morris, RA
    Viggiano, AA
    JOURNAL OF PHYSICAL CHEMISTRY A, 2005, 109 (11): : 2559 - 2563
  • [2] Rate constants and products of the reactions of POxCly- ions with O2, and O3
    Fernandez, A
    Midey, AJ
    Miller, TM
    Viggiano, AA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U311 - U311
  • [3] KINETICS OF THERMAL-OXIDATION OF SILICON IN O2/H2O AND O2/CL2 MIXTURES
    DEAL, BE
    HESS, DW
    PLUMMER, JD
    HO, CP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (02) : 339 - 346
  • [4] Reactivities of H2, O2 and H2O with the Cr surface between 77 K and 298 K
    Kato, S
    Suzuki, R
    Kawamoto, Y
    Uchida, H
    JOURNAL OF ALLOYS AND COMPOUNDS, 2006, 413 (1-2) : 214 - 217
  • [5] RATE CONSTANTS FOR THE REACTIONS OF OH WITH CLO, CL2, AND CL2O AT 298K
    LEU, MT
    LIN, CL
    GEOPHYSICAL RESEARCH LETTERS, 1979, 6 (06) : 425 - 428
  • [6] REACTIONS OF NA+, K+, AND BA+ IONS WITH O2, NO, AND H2O MOLECULES
    JOHNSEN, R
    BROWN, HL
    BIONDI, MA
    JOURNAL OF CHEMICAL PHYSICS, 1971, 55 (01): : 186 - &
  • [7] A model of reactions in a corona discharge in the O2(g)-H2O system
    Piskarev, IM
    RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY, 2000, 74 (03): : 464 - 469
  • [9] Reaction kinetics of cerium thin films with H2, O2, and H2O systems at 298 K
    Hadano, M
    Urushihara, N
    Terada, S
    Katsuya, D
    Uchida, H
    JOURNAL OF ALLOYS AND COMPOUNDS, 2002, 330 : 498 - 501
  • [10] RATE CONSTANTS FOR H + O2 + M AT 298-K FOR M = HE, N2, AND H2O
    HSU, KJ
    DURANT, JL
    KAUFMAN, F
    JOURNAL OF PHYSICAL CHEMISTRY, 1987, 91 (07): : 1895 - 1899