X-band inverse class-F GaN internally-matched power amplifier

被引:1
|
作者
Zhao, Bo-Chao [1 ]
Lu, Yang [1 ]
Han, Wen-Zhe [1 ]
Zheng, Jia-Xin [2 ]
Zhang, Heng-Shuang [1 ]
Ma, Pei-jun [1 ]
Ma, Xiao-Hua [2 ]
Hao, Yue [1 ,2 ]
机构
[1] Xidian Univ, Sch Microelect, Xian 710071, Peoples R China
[2] Xidian Univ, Sch Adv Mat & Nanotechnol, Xian 710071, Peoples R China
基金
国家高技术研究发展计划(863计划);
关键词
GaN internally-matched power amplifier; inverse class-F; compensation design; X-band power amplifier;
D O I
10.1088/1674-1056/25/9/097306
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
An X-band inverse class-F power amplifier is realized by a 1-mm AlGaN/GaN high electron mobility transistor (HEMT). The intrinsic and parasitic components inside the transistor, especially output capacitor C-ds, influence the harmonic impedance heavily at the X-band, so compensation design is used for meeting the harmonic condition of inverse class-F on the current source plane. Experiment results show that, in the continuous-wave mode, the power amplifier achieves 61.7% power added efficiency (PAE), which is 16.3% higher than the class-AB power amplifier realized by the same kind of HEMT. To the best of our knowledge, this is the first inverse class-F GaN internally-matched power amplifier, and the PAE is quite high at the X-band.
引用
收藏
页数:5
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