Life-Cycle Nitrogen Trifluoride Emissions from Photovoltaics

被引:15
|
作者
Fthenakis, Vasilis [1 ,2 ]
Clark, Daniel O. [3 ]
Moalem, Mehran [3 ]
Chandler, Phil [3 ]
Ridgeway, Robert G. [4 ]
Hulbert, Forrest E. [4 ]
Cooper, David B. [4 ]
Maroulis, Peter J. [4 ]
机构
[1] Brookhaven Natl Lab, New York, NY USA
[2] Columbia Univ, New York, NY USA
[3] Appl Mat Inc, Santa Clara, CA 95054 USA
[4] Air Prod & Chem Inc, Allentown, PA USA
基金
美国能源部;
关键词
REMOTE MICROWAVE PLASMA; CHAMBER CLEANS; NF3;
D O I
10.1021/es100401y
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Amorphous- and nanocrystalline-silicon thin-film photovoltaic modules are made in high-throughput manufacturing lines that necessitate quickly cleaning the reactor. Using NF(3), a potent greenhouse gas, as the cleaning agent triggered concerns as recent reports reveal that the atmospheric concentrations of this gas have increased significantly. We quantified the lifecycle emissions of NF(3) in photovoltaic (PV) manufacturing, on the basis of actual measurements at the facilities of a major producer of NF(3) and of a manufacturer of PV end-use equipment From these, we defined the best practices and technologies that are the most likely to keep worldwide atmospheric concentrations of NF(3) at very low radiative forcing levels. For the average U.S. insolation and electricity-grid conditions, the greenhouse gas (GHG) emissions from manufacturing and using NF(3) in current PV a-Si and tandem a-Si/nc-Si facilities add 2 and 7 g CO(2eq)/kWh, which can be displaced within the first 1-4 months of the PV system life.
引用
收藏
页码:8750 / 8757
页数:8
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