Attenuation of Photoelectron Emission by a Single Organic Layer

被引:6
|
作者
Wagner, Thorsten [1 ]
Antczak, Grasyna [2 ]
Gyoeroek, Michael [1 ]
Sabik, Agata [2 ]
Volokitina, Anna [1 ]
Golek, Franciszek [2 ]
Zeppenfeld, Peter [1 ]
机构
[1] Johannes Kepler Univ Linz, Inst Expt Phys, Surface Sci Div, A-4040 Linz, Austria
[2] Univ Wroclaw, Inst Expt Phys, PL-50204 Wroclaw, Poland
基金
奥地利科学基金会;
关键词
cobalt-phthalocyanine; work function; photoelectron emission microscopy; Anderson method; Ag(100); Fowler-DuBridge theory; attenuation of electrons; inelastic mean free path; ENERGY; GROWTH;
D O I
10.1021/acsami.2c02996
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report an in situ study of the thin-film growth of cobalt-phthalocyanine on Ag(100) surfaces using photoelectron emission microscopy (PEEM) and the Anderson method. Based on the Fowler-DuBridge theory, we were able to correlate the evolution of the mean electron yield acquired with PEEM for coverages up to two molecular layers of cobalt-phthalocyanine to the global work function changes measured with the Anderson method. For coverages above two monolayers, the transients measured with the Anderson method and those obtained with PEEM show different trends. We exploit this discrepancy to determine the inelastic mean free path of the low-energy electrons while passing through the third layer of CoPc.
引用
收藏
页码:23983 / 23989
页数:7
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