Analysis of near-field intensity distributions of high-compression Talbot array illuminators using rigorous diffraction theory

被引:10
|
作者
Klaus, W
Oka, K
Fujino, M
Kodate, K
机构
[1] Commun Res Labs, Opt Space Commun Grp, Tokyo 1848795, Japan
[2] Japan Womens Univ, Fac Sci, Bunkyo Ku, Tokyo 1128681, Japan
[3] TOPCON CORP, R&D Ctr, Itabashi Ku, Tokyo 1748580, Japan
关键词
Talbot effect; Talbot array illuminator; rigorous coupled-wave analysis; near-field optics; illumination efficiency;
D O I
10.1007/s10043-001-0271-6
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The technology nowadays employed in the field of binary optics allows a relatively easy fabrication of grating structures down to the wavelength region. The analysis of light propagation through such grating structures requires the use of rigorous diffraction theories such as the rigorous coupled-wave analysis (RCWA), in order to take proper account of polarization effects in the electric and magnetic field and the thickness of the grating. In this paper, we examine the near-field intensity distributions and associated illumination efficiencies of Talbot array illuminators (TAIL's) with compression ratios of 8 and 16 using RCWA. The high illumination efficiency observed close to the grating surface is expected to bring about new applications of TAIL's in the field of super-resolution and near-field optics.
引用
收藏
页码:271 / 275
页数:5
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