Analysis of cobalt, tantalum, titanium, vanadium and chromium in tungsten carbide by inductively coupled plasma-optical emission spectrometry

被引:12
|
作者
Archer, M
McCrindle, RI
Rohwer, ER
机构
[1] CSIR, Natl Meteorol Lab, ZA-0001 Pretoria, South Africa
[2] Technikon Pretoria, Dept Chem & Phys, ZA-0007 Arcadia, South Africa
[3] Univ Pretoria, Dept Chem, ZA-0002 Pretoria, South Africa
关键词
D O I
10.1039/b310482f
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Inductively coupled plasma optical emission spectroscopy (ICP-OES) was used to measure the concentrations of cobalt, tantalum, titanium, vanadium and chromium in solutions of tungsten carbide. The main advantage of the method described here lies in the speed, convenience and effectiveness of the dissolution procedure. Aliquots of powdered tungsten carbide were dissolved in a solution of 5% aqua regia in 30% hydrogen peroxide. Complete dissolution was usually achieved within 10 min. The accuracy of the method was assessed by the analysis of certified reference materials, secondary reference materials and matrix spiking. The method was successfully applied to commercial type samples with differing compositions. Slightly more emphasis was placed on the measurement of vanadium, since no information on the measurement of-this element in solutions of tungsten carbide, by ICP-OES, has been published. Investigation of the interference effects of the elements in the sample matrix on each other was essential for accurate results comparable to other published analytical methods.
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页码:1493 / 1496
页数:4
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