Lattice dilation and local magnetic anisotropy in nitrogenated iron-based soft magnetic films

被引:13
|
作者
Viala, B [1 ]
Minor, MK [1 ]
Barnard, JA [1 ]
机构
[1] UNIV ALABAMA,DEPT MET & MAT ENGN,TUSCALOOSA,AL 35487
基金
美国国家科学基金会;
关键词
D O I
10.1109/20.538672
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Soft magnetism in FeN-based films intimately depends on the lattice dilation caused by N incorporation. We suggest that the softest magnetic properties can be predicted in terms of critical lattice dilation. A detailed investigation of the structure constant in FeTaN films is presented and theoretically described. A comparison is made between Takahashi and Shimatsu's model as function of the lattice dilation and Doyle and Finnegan's model with respect to the film stress. Finally, predictions are made for the behavior of FeSiN and FeAlN films.
引用
收藏
页码:3506 / 3508
页数:3
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